Ultra-low temperature ALD device CMVA-1000 for TGV (maximum 600 corners)
Compatible with high aspect ratio TGV/TSV. The world's largest chamber size for ALD (1000mm□).
【Features】 - OH radical oxidation using bubbling H2O/Ar and High Density Plasma - Dense and well-covered film formation; capable of forming dense, homogeneous films with uniform thickness - Compatible with most metal oxide films - Excellent adhesion on any substrate (material, flatness, shape, etc.) - Control of film thickness according to application - Film formation possible at room temperature 【Application Examples】 - Capable of large area applications - TGV/moisture-proof films 【Consultation for Film Formation and Test Coating Available】 At Creative Coatings, we accept requests for test coatings and sample creation. We can listen to your needs and suggest suitable equipment, types of films, and film thicknesses. Please feel free to consult with us. ++++++++++++++++++++++++++++++ We provide next-generation vapor phase technology demanded by the times and environment. We contribute to technological innovation with our dual technology of low-temperature (room temperature) ALD equipment for semiconductors and powder low-temperature (room temperature) ALD film formation equipment.
- Company：Creative Coatings Co., Ltd.
- Price：Other
